Enhancing the optical and electrical properties of SnO2 films by plasma etching deposition

Bo Huei Liao, Cheng Chung Lee, Chien Cheng Kuo, Ping Zen Chen

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review


Fluorine-doped tin oxide films have been deposited by plasma etching deposition with Sn target. The extinction coefficient is less than 1.5x10-3 in the range of 400nm to 800nm and the lowest resistitivuty is 1.5×10-3 Ω-cm.

Original languageEnglish
Title of host publicationOptical Interference Coatings, OIC 2010
PublisherOptical Society of America (OSA)
ISBN (Print)9781557528919
StatePublished - 2010
EventOptical Interference Coatings, OIC 2010 - Tucson, AZ, United States
Duration: 6 Jun 201011 Jun 2010

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701


ConferenceOptical Interference Coatings, OIC 2010
Country/TerritoryUnited States
CityTucson, AZ


Dive into the research topics of 'Enhancing the optical and electrical properties of SnO<sub>2</sub> films by plasma etching deposition'. Together they form a unique fingerprint.

Cite this