Enhancement of Ti-containing hydrogenated carbon (TiC:H) films by high-power plasma-sputtering

Jyh Gwo, Chun Lin Chu, Ming Jui Tsai, Shyong Lee

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6 Scopus citations


Ti-containing amorphous hydrogenated carbon (TiC:H) thin films were deposited on stainless steel SS304 substrates by high-power pulsed magnetron sputtering (HPPMS) in an atmosphere of mixed Ar and C 2 H 2 gases using titanium metal as the cathodic material. The multilayer structure of the deposited film had a TiTiCDLC gradient to improve adhesion and reduce residual stress. This study investigates the effects of substrate bias and target-to-substrate distance on the mechanical properties of TiC:H films. Film properties, including composition, morphology, microstructure, mechanical, and tribology, were examined by glow discharge spectroscopy (GDS), scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman spectroscopy, and a nanoindenter and a pin-on-disk tribometer. Experiments revealed impressive results.

Original languageEnglish
Pages (from-to)3433-3437
Number of pages5
JournalApplied Surface Science
Issue number8
StatePublished - 1 Feb 2012


  • Diamond-like carbon
  • High-power pulsed magnetron sputtering
  • MeDLC


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