Skip to main navigation
Skip to search
Skip to main content
National Central University Home
Help & FAQ
Link opens in a new tab
English
中文
Search content at National Central University
Home
Scholar Profiles
Research units
Projects
Research output
Datasets
Prizes
Activities
Press/Media
Impacts
Electrochemical characteristics of La-Ni-Al thin films
Chi Ying Vanessa Li
, Zhong Min Wang
, Shi Liu
,
Sammy Lap Ip Chan
Department of Chemical and Materials Engineering
Research output
:
Contribution to journal
›
Article
›
peer-review
10
Scopus citations
Overview
Fingerprint
Fingerprint
Dive into the research topics of 'Electrochemical characteristics of La-Ni-Al thin films'. Together they form a unique fingerprint.
Sort by
Weight
Alphabetically
Keyphrases
Electrochemical Characteristics
100%
NiAl
100%
LaNi4.25Al0.75
100%
Al Thin Film
100%
Microstructure
50%
X Ray Diffraction
50%
Bulk Material
50%
Electrochemical Performance
50%
Discharge Capacity
50%
Electrochemical Properties
50%
Discharge Potential
50%
Hydrogen Storage
50%
Cu Substrate
50%
Film Electrode
50%
Discharge Process
50%
Crystal Form
50%
Maximum Discharge
50%
AB5 Alloy
50%
Battery Testing
50%
DC Magnetron Sputtering
50%
Uniform Thickness
50%
Random Size
50%
Engineering
Thin Films
100%
Ray Diffraction
50%
Cross Section
50%
Bulk Material
50%
Magnetron
50%
Discharge Capacity
50%
Hydrogen Storage
50%
Form Crystal
50%
Physics
Thin Films
100%
Scanning Electron Microscopy
50%
X Ray Diffraction
50%
Magnetron Sputtering
50%
Hydrogen Storage
50%
Crystal Morphology
50%
Material Science
Thin Films
100%
Film
100%
Scanning Electron Microscopy
16%
X-Ray Diffraction
16%
Magnetron Sputtering
16%
Electrochemical Property
16%
Focused Ion Beam
16%
Surface (Surface Science)
16%