Effects of Etching Variations on Ge/Si Channel Formation and Device Performance

Physics & Astronomy

• fins 83%
• etching 70%
• performance 40%
• insulators 34%
• packing density 28%
• silicon 24%
• packaging 24%
• hardware 22%
• emerging 20%
• reactors 17%
• scaling 16%
• optimization 15%
• fabrication 14%
• annealing 13%
• profiles 12%
• simulation 8%

Engineering & Materials Science

• Etching 100%
• Dislocations (crystals) 36%
• Silicon 36%
• Dry etching 33%
• Annealing 23%
• Plasmas 21%
• Packaging 20%
• Fabrication 17%
• Substrates 16%
• Computer hardware 13%
• Hot Temperature 11%

Chemical Compounds

• Etching 83%
• Threading Dislocation 58%
• Misfit Dislocation 57%
• Annealing 24%
• Simulation 19%
• Plasma 19%