Effects of bias on properties of Ti-C:H films coated by filtered cathodic vacuum arc

S. Lee, C. L. Chu, J. Gwo, J. J. Huang, M. J. Tsai, S. M. Wang

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

A bias voltage apparatus is attached to the filtered cathode vacuum arc system for coating a diamond-like film containing Ti on WC substrate. Ti, which acts as the cathode target, is sputtered by plasma, and reacts with C 2H2 gas, then deposits on the WC under working conditions of 60 A current and voltage between 250 and 2275 V. Such processed diamond-like film containing Ti(Ti-C:H) is analysed by glow discharge spectroscopy, X-ray diffraction, X-ray photoelectron spectroscopy and nanoindentation for determining Ti concentration, crystallographic structure, bonding mode and mechanical properties. Characteristic parameters are determined to obtain suitable properties, and the underlying reasons are also addressed.

Original languageEnglish
Pages (from-to)531-535
Number of pages5
JournalSurface Engineering
Volume27
Issue number7
DOIs
StatePublished - Aug 2011

Keywords

  • DLC
  • Filtered cathodic vacuum arc
  • Metal containing carbon film

Fingerprint

Dive into the research topics of 'Effects of bias on properties of Ti-C:H films coated by filtered cathodic vacuum arc'. Together they form a unique fingerprint.

Cite this