A bias voltage apparatus is attached to the filtered cathode vacuum arc system for coating a diamond-like film containing Ti on WC substrate. Ti, which acts as the cathode target, is sputtered by plasma, and reacts with C 2H2 gas, then deposits on the WC under working conditions of 60 A current and voltage between 250 and 2275 V. Such processed diamond-like film containing Ti(Ti-C:H) is analysed by glow discharge spectroscopy, X-ray diffraction, X-ray photoelectron spectroscopy and nanoindentation for determining Ti concentration, crystallographic structure, bonding mode and mechanical properties. Characteristic parameters are determined to obtain suitable properties, and the underlying reasons are also addressed.
- Filtered cathodic vacuum arc
- Metal containing carbon film