Effect of fabrication parameters on the characteristics of fresnel lens and piezoelectric transducers

Tuan Anh Bui; Min Chun Pan; Chien Cheh Lee; Wen Ching Shih

doi:10.1080/00150193.2012.741941

Effect of fabrication parameters on the characteristics of fresnel lens and piezoelectric transducers

Tuan Anh Bui, Min Chun Pan, Chien Cheh Lee, Wen Ching Shih

Research output: Contribution to journal › Article › peer-review

Abstract

A two-mask fabrication process of a four-level Fresnel lens was used to evaluate its characteristics through investigating the effect of SU-8 photoresist on the profile of the focusing lens. A two-step deposition of ZnO films was applied to develop a feasible fabrication of a piezoelectric transducer with the structure Al/ZnO/Pt/Ti/SiO₂/Si under reasonable conditions, which include deposition pressure of 0.7 Pa and 1.3 Pa, RF power of 100 W and 178 W, and sputtering gas ratio Ar: O₂ = 1:3 and 1:1 for first and second step deposition, respectively. Highly c-axis textured ZnO films were successfully obtained through two-step deposition process.

Original language	English
Pages (from-to)	70-80
Number of pages	11
Journal	Ferroelectrics
Volume	437
Issue number	1
DOIs	https://doi.org/10.1080/00150193.2012.741941
State	Published - 2012

Keywords

Fresnel lens
Piezoelectric transducer
Sputtering
Ultrasonic focusing ejector
Zinc oxide (ZnO)

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10.1080/00150193.2012.741941

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title = "Effect of fabrication parameters on the characteristics of fresnel lens and piezoelectric transducers",

abstract = "A two-mask fabrication process of a four-level Fresnel lens was used to evaluate its characteristics through investigating the effect of SU-8 photoresist on the profile of the focusing lens. A two-step deposition of ZnO films was applied to develop a feasible fabrication of a piezoelectric transducer with the structure Al/ZnO/Pt/Ti/SiO2/Si under reasonable conditions, which include deposition pressure of 0.7 Pa and 1.3 Pa, RF power of 100 W and 178 W, and sputtering gas ratio Ar: O2 = 1:3 and 1:1 for first and second step deposition, respectively. Highly c-axis textured ZnO films were successfully obtained through two-step deposition process.",

keywords = "Fresnel lens, Piezoelectric transducer, Sputtering, Ultrasonic focusing ejector, Zinc oxide (ZnO)",

author = "Bui, {Tuan Anh} and Pan, {Min Chun} and Lee, {Chien Cheh} and Shih, {Wen Ching}",

note = "Funding Information: Financial support by Tatung University, Taiwan, R.O.C. under contract No. B100-O03-043 and the National Science Council, R.O.C. through project No. 96-2221-E-008-083 and 99-2221-E-036-004 is gratefully acknowledged by the authors.",

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AU - Bui, Tuan Anh

AU - Pan, Min Chun

AU - Lee, Chien Cheh

AU - Shih, Wen Ching

N1 - Funding Information: Financial support by Tatung University, Taiwan, R.O.C. under contract No. B100-O03-043 and the National Science Council, R.O.C. through project No. 96-2221-E-008-083 and 99-2221-E-036-004 is gratefully acknowledged by the authors.

PY - 2012

Y1 - 2012

N2 - A two-mask fabrication process of a four-level Fresnel lens was used to evaluate its characteristics through investigating the effect of SU-8 photoresist on the profile of the focusing lens. A two-step deposition of ZnO films was applied to develop a feasible fabrication of a piezoelectric transducer with the structure Al/ZnO/Pt/Ti/SiO2/Si under reasonable conditions, which include deposition pressure of 0.7 Pa and 1.3 Pa, RF power of 100 W and 178 W, and sputtering gas ratio Ar: O2 = 1:3 and 1:1 for first and second step deposition, respectively. Highly c-axis textured ZnO films were successfully obtained through two-step deposition process.

AB - A two-mask fabrication process of a four-level Fresnel lens was used to evaluate its characteristics through investigating the effect of SU-8 photoresist on the profile of the focusing lens. A two-step deposition of ZnO films was applied to develop a feasible fabrication of a piezoelectric transducer with the structure Al/ZnO/Pt/Ti/SiO2/Si under reasonable conditions, which include deposition pressure of 0.7 Pa and 1.3 Pa, RF power of 100 W and 178 W, and sputtering gas ratio Ar: O2 = 1:3 and 1:1 for first and second step deposition, respectively. Highly c-axis textured ZnO films were successfully obtained through two-step deposition process.

KW - Fresnel lens

KW - Piezoelectric transducer

KW - Sputtering

KW - Ultrasonic focusing ejector

KW - Zinc oxide (ZnO)

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DO - 10.1080/00150193.2012.741941

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VL - 437

SP - 70

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JO - Ferroelectrics

JF - Ferroelectrics

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Effect of fabrication parameters on the characteristics of fresnel lens and piezoelectric transducers

Abstract

Keywords

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