E-beam-evaporated Al2O3 for InAs/AlSb metal-oxide-semiconductor HEMT development

H. K. Lin, D. W. Fan, Y. C. Lin, P. C. Chiu, C. Y. Chien, P. W. Li, J. I. Chyi, C. H. Ko, T. M. Kuan, M. K. Hsieh, W. C. Lee, C. H. Wann

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