Determination of the mechanical properties of thin films by digital phase shifting interferometry

Chuen Lin Tien, Cheng Chung Lee, Yu Lung Tsai, Wen Shing Sun

Research output: Contribution to journalArticlepeer-review

17 Scopus citations

Abstract

A new method for the measurement of internal stress and coefficient of thermal expansion of thin oxide films is presented and investigated experimentally, that combines digital phase shifting interferometry with image-processing technique to improve the accuracy of the conventional interferometric method. The change of the deflection (or curvature) of the coated substrates by the deposited film can be obtained by the phase maps. Using the Zernike polynomial fitting algorithm, a 3-D contour plot is generated from the polynomial coefficients to visualize the deformation of the thin film. Four oxide films prepared by ion beam sputter deposition with a Kaufman-type ion source are investigated for their mechanical properties. The contribution of the proposed method is to increase the sensitivity and accuracy of the temperature-dependence stress measurements.

Original languageEnglish
Pages (from-to)325-331
Number of pages7
JournalOptics Communications
Volume198
Issue number4-6
DOIs
StatePublished - 1 Nov 2001

Keywords

  • Ion beam sputter deposition
  • Phase shifting interferometry
  • Stress
  • Thermal expansion coefficient
  • Thin film
  • Zernike plynomial fitting

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