Designs for optimizing depth of focus and spot size for UV laser ablation

An Chi Wei, Jyh Rou Sze, Jyh Long Chern

Research output: Contribution to journalArticlepeer-review


The proposed optical systems are designed for extending the depths of foci (DOF) of UV lasers, which can be exploited in the laser-ablation technologies, such as laser machining and lithography. The designed systems are commonly constructed by an optical module that has at least one aspherical surface. Two configurations of optical module, lens-only and lens-reflector, are presented with the designs of 2-lens and 1-lens-1-reflector demonstrated by commercially optical software. Compared with conventional DOF-enhanced systems, which required the chromatic aberration lenses and the light sources with multiple wavelengths, the proposed designs are adapted to the single-wavelength systems, leading to more economical and efficient systems.

Original languageEnglish
Pages (from-to)411-416
Number of pages6
JournalApplied Physics A: Materials Science and Processing
Issue number2
StatePublished - Nov 2010


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