Design of a High-Efficiency Multilayer Dielectric Diffraction Grating with Enhanced Laser Damage Threshold

Duy Thanh Cu, Tien Dat Pham, Vu Tuan Hung Le, Meng Chi Li, Hung Pin Chen, Chien Cheng Kuo

Research output: Contribution to journalArticlepeer-review

Abstract

Diffraction gratings are becoming increasingly widespread in optical applications, notably in lasers. This study presents the work on the characterization and evaluation of Multilayer Dielectric Diffraction Gratings (MDG) based on the finite element method using Comsol MultiPhysics software. The optimal multilayer dielectric diffraction grating structure using a rectangular three-layer structure consisting of an aluminum oxide Al2O3 layer sandwiched between two silicon diox-ide SiO2 layers on a multilayer dielectric mirror is simulated. Results show that this MDG for non-polarized lasers at 1064 nm with a significantly enhanced −1st diffraction efficiency of 97.4%, reach-ing 98.3% for transverse-electric (TE) polarization and 96.3% for transverse-magnetic (TM) polari-zation. This design is also preferable in terms of the laser damage threshold (LDT) because most of the maximum electric field is spread across the high LDT material SiO2 for TE polarization and scattered outside the grating for TM polarization. This function allows the system to perform better and be more stable than normal diffraction grating under a high-intensity laser.

Original languageEnglish
Article number1952
JournalNanomaterials
Volume12
Issue number12
DOIs
StatePublished - 1 Jun 2022

Keywords

  • diffraction efficiency
  • high laser damage threshold
  • multilayer dielectric grating

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