Design and fabrication of vertically aligned single-crystalline Si nanotube arrays and their enhanced broadband absorption properties

Y. M. Tseng, R. Y. Gu, S. L. Cheng

Research output: Contribution to journalArticlepeer-review

7 Scopus citations

Abstract

We propose and demonstrate a new and room-temperature approach for the fabrication of well-ordered arrays of vertically aligned, diameter-, length-, and interspacing-controllable Si nanotubes on (0 0 1)Si substrates. In this approach, a unique, hexagonally-ordered Au disk/hole dual nanostructure pattern with uniform size and spacing was first produced on the surface of (0 0 1)Si substrate and was then used as the catalyst to etch vertically downward into the Si substrate by Au-catalyzed chemical etching. All the produced vertical Si nanotubes were identified to be single crystalline with the same axial orientation of [0 0 1] and their lengths could be readily tuned by adjusting the etching time. The produced long vertical Si nanotubes with catalytic Au disk/hole dual nanostructures show greatly enhanced hydrophobicity (water contact angle: ~146°) and broadband absorption properties (average visible-light absorptance: ~96%; average near-IR absorptance: >70%) compared to the corresponding bare (0 0 1)Si substrate and Si nanorod samples. The obtained results present the exciting prospects that the new approach proposed here promises to open opportunities for the design and construction of various 1-D hollow semiconductor nanodevices with multi-function.

Original languageEnglish
Article number145223
JournalApplied Surface Science
Volume508
DOIs
StatePublished - 1 Apr 2020

Keywords

  • Au-catalyzed etching
  • Broadband light absorption
  • Hydrophobicity
  • Nanosphere lithography
  • Oxygen plasma
  • Si nanotube

Fingerprint

Dive into the research topics of 'Design and fabrication of vertically aligned single-crystalline Si nanotube arrays and their enhanced broadband absorption properties'. Together they form a unique fingerprint.

Cite this