Deposition of GeSn film on Si substrate by plasma-enhanced chemical vapor deposition using GeCl4 and SnCl4 in H2 for developing short-wave infrared Si photonics

Tzu Hung Yang, Zhe Zhang Lin, Shang Che Tsai, Jia Zhi Dai, Shih Ming Chen, Ming Wei Lin, Szu yuan Chen

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Engineering & Materials Science

Chemical Compounds

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