Deposition of Al-doped and Al, Sc-co-doped zinc oxide films by RF- and DC-sputtering of the ZnO and Al-xSc (x = 0, 0.4, 0.8 and 1.7 wt.%) targets

Jing Chie Lin, Kun Cheng Peng, C. A. Tseng, Sheng Long Lee

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