Abstract
Excellent passivation of an n-type Czochralski crystalline silicon surface is made possible by the deposition of hydrogenated silicon carbide (Si 1-xCx:H) layers in the electron cyclotron resonance chemical vapor deposition. We investigate the structural effect with various CH4/SiH4 dilution ratios, and the lowest effective surface recombination velocity (21.03cm/s) that can be obtained. We also demonstrate that the Voc can be improved more than 200mV by inserting Si 1-xCx:H layers to form hetero-junction with intrinsic thin layer (HIT) solar cells. The conversion efficiency of the planar HIT solar cell with μc-Si emitter can reach 13%.
Original language | English |
---|---|
Article number | 241601 |
Journal | Applied Physics Letters |
Volume | 101 |
Issue number | 24 |
DOIs | |
State | Published - 10 Dec 2012 |