Correlation of impedance matching and optical emission spectroscopy during plasma-enhanced chemical vapor deposition of nanocrystalline silicon thin films

Li Han Kau, Hung Jui Huang, Hsueh Er Chang, Yu Lin Hsieh, Chien Chieh Lee, Yiin Kuen Fuh, Tomi T. Li

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

In this paper, the correlation of impedance matching and optical emission spectroscopy during plasma-enhanced chemical vapor deposition (PECVD) was systematically investigated in SiH 4 plasma diluted by various hydrogen dilution ratios. At the onset of nanocrystallinity in SiH 4- depleted plasma condition, the SiH + radical reached a threshold value as the dominant radical, such that a-Si to nc-Si transition was obtained. Furthermore, the experimental data of impedance analysis showed that matching behavior can be greatly influenced by variable plasma parameters due to the change of various hydrogen dilution ratios, which is consistent with the recorded optical emission spectra (OES) of Hα* radicals. Quadruple mass spectrometry (QMS) and transmission electron microscopy (TEM) were employed as associated diagnostic and characterization tools to confirm the phase transformation and existence of silicon nanocrystals.

Original languageEnglish
Article number305
JournalCoatings
Volume9
Issue number5
DOIs
StatePublished - 1 May 2019

Keywords

  • Crystalline fraction
  • Crystallite size
  • Hydrogen dilution ratio
  • Impedance analysis
  • Nanocrystalline
  • Optical emission spectroscopy

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