@inproceedings{5a9e1e0237e14a43b5a22441ab320236,
title = "Controlling the feature size made by two-photon photopolymerization in a threshold material",
abstract = "The feature size made by two-photon photopolymerization is described by a threshold model. In a negative photoresist SU-8 we show the linewidth fabricated by this nonlinear process is consistent with the prediction of this model.",
author = "Chang, {Ting Wei} and Mong, {Hong Yao} and Lin, {Jiunn Yuan} and Jyhpyng Wang and Lee, {Chau Hwang}",
note = "Publisher Copyright: {\textcopyright} 2003 OSA/CLEO 2003, {\textcopyright} 2002 Optical Society of America.; Conference on Lasers and Electro-Optics, CLEO 2003 ; Conference date: 01-06-2003 Through 06-06-2003",
year = "2003",
language = "???core.languages.en_GB???",
series = "Optics InfoBase Conference Papers",
publisher = "Optica Publishing Group (formerly OSA)",
booktitle = "Conference on Lasers and Electro-Optics, CLEO 2003",
}