Abstract
The feature size made by two-photon photopolymerization is described by a threshold model. In a negative photoresist SU-8 we show the linewidth fabricated by this nonlinear process is consistent with the prediction of this model.
Original language | English |
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Pages (from-to) | 593-594 |
Number of pages | 2 |
Journal | OSA Trends in Optics and Photonics Series |
Volume | 88 |
State | Published - 2003 |
Event | Conference on Lasers and Electro-Optics (CLEO); Postconference Digest - Baltimore, MD, United States Duration: 1 Jun 2003 → 6 Jun 2003 |