Controlling the feature size made by two-photon photopolymerization in a threshold material

Ting Wei Chang, Hong Yao Mong, Jiunn Yuan Lin, Jyhpyng Wang, Chau Hwang Lee

Research output: Contribution to journalConference articlepeer-review

Abstract

The feature size made by two-photon photopolymerization is described by a threshold model. In a negative photoresist SU-8 we show the linewidth fabricated by this nonlinear process is consistent with the prediction of this model.

Original languageEnglish
Pages (from-to)593-594
Number of pages2
JournalOSA Trends in Optics and Photonics Series
Volume88
StatePublished - 2003
EventConference on Lasers and Electro-Optics (CLEO); Postconference Digest - Baltimore, MD, United States
Duration: 1 Jun 20036 Jun 2003

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