The feature size made by two-photon photopolymerization is described by a threshold model. In a negative photoresist SU-8 we show the linewidth fabricated by this nonlinear process is consistent with the prediction of this model.
|Number of pages||2|
|Journal||OSA Trends in Optics and Photonics Series|
|State||Published - 2003|
|Event||Conference on Lasers and Electro-Optics (CLEO); Postconference Digest - Baltimore, MD, United States|
Duration: 1 Jun 2003 → 6 Jun 2003