Controllable fabrication of nanogap structure based on nanosphere lithography

Daxiao Zhang, Dongjie Hu, Yongliang Zhou, Shaoliang Cheng

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

One method was developed for fabricating nanogap structures, which combined the nanosphere lithography, reaction ion etching and glancing deposition technologies. The results show that 10 nm-200 nm nanogaps structure could be prepared by changing the deposition angle, and nanogap structure patterns could be changed with different incident orientation.

Original languageEnglish
Title of host publicationNanotechnology and Advanced Materials
Pages90-94
Number of pages5
DOIs
StatePublished - 2012
Event2012 International Conference on Nanotechnology Technology and Advanced Materials, ICNTAM 2012 - Hong Kong, Hong Kong
Duration: 12 Apr 201213 Apr 2012

Publication series

NameAdvanced Materials Research
Volume486
ISSN (Print)1022-6680

Conference

Conference2012 International Conference on Nanotechnology Technology and Advanced Materials, ICNTAM 2012
Country/TerritoryHong Kong
CityHong Kong
Period12/04/1213/04/12

Keywords

  • Fabrication
  • Nanogap Structure
  • Nanosphere Lithography

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