Concentration variability of halocarbons over an electronics industrial park and its implication in compliance with the Montreal protocol

Chih Chung Chang, Giunn Guang Lo, Cheng Hsiung Tsai, Jia Lin Wang

Research output: Contribution to journalArticlepeer-review

28 Scopus citations

Abstract

This work investigated fugitive emissions of anthropogenic halocarbons in a semiconductor and electronics industrial park in Taiwan using both flask and in-situ measurement methods. Large concentration variabilities in methylchloroform, trichloroethene, and tetrachloroethene suggested substantial usage and emissions in the industrial park. While the variability of CFC-113, CCl4, and CFC-11 was rather small using the flask sampling technique, the in-situ method with its higher frequency, however, showed significantly larger variability arising from observing periodic emission episodes, which were highly correlated with wind direction and topography of the park.

Original languageEnglish
Pages (from-to)3273-3279
Number of pages7
JournalEnvironmental Science and Technology
Volume35
Issue number16
DOIs
StatePublished - 15 Aug 2001

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