Coating uniformity improvement for a dense-wavelength-division-multiplexing filter by use of the etching effect

Jin Cherng Hsu; Cheng Chung Lee; Chien Chung Kuo; Sheng Hui Chen; Jean Yee Wu; Huang Lu Chen; Ching Yi Wei

doi:10.1364/AO.44.004402

Coating uniformity improvement for a dense-wavelength-division-multiplexing filter by use of the etching effect

Jin Cherng Hsu, Cheng Chung Lee, Chien Chung Kuo, Sheng Hui Chen, Jean Yee Wu, Huang Lu Chen, Ching Yi Wei

Department of Optics and Photonics

Research output: Contribution to journal › Article › peer-review

11 Scopus citations

Abstract

The uniformity of optical narrow-bandpass filters for dense wavelength division multiplexing (DWDM) has been improved by control of the coating parameters of electron guns and the ion source. The optical film was deposited by the electron gun and was etched by the ion source during the ion-assisted deposition process. The uniformity of the coating of a 100 GHz DWDM filter is better than ±0.003% over a circular area of 50 mm in diameter when such an etching process is used.

Original language	English
Pages (from-to)	4402-4407
Number of pages	6
Journal	Applied Optics
Volume	44
Issue number	20
DOIs	https://doi.org/10.1364/AO.44.004402
State	Published - 10 Jul 2005

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abstract = "The uniformity of optical narrow-bandpass filters for dense wavelength division multiplexing (DWDM) has been improved by control of the coating parameters of electron guns and the ion source. The optical film was deposited by the electron gun and was etched by the ion source during the ion-assisted deposition process. The uniformity of the coating of a 100 GHz DWDM filter is better than ±0.003% over a circular area of 50 mm in diameter when such an etching process is used.",

author = "Hsu, {Jin Cherng} and Lee, {Cheng Chung} and Kuo, {Chien Chung} and Chen, {Sheng Hui} and Wu, {Jean Yee} and Chen, {Huang Lu} and Wei, {Ching Yi}",

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T1 - Coating uniformity improvement for a dense-wavelength-division-multiplexing filter by use of the etching effect

AU - Hsu, Jin Cherng

AU - Lee, Cheng Chung

AU - Kuo, Chien Chung

AU - Chen, Sheng Hui

AU - Wu, Jean Yee

AU - Chen, Huang Lu

AU - Wei, Ching Yi

PY - 2005/7/10

Y1 - 2005/7/10

N2 - The uniformity of optical narrow-bandpass filters for dense wavelength division multiplexing (DWDM) has been improved by control of the coating parameters of electron guns and the ion source. The optical film was deposited by the electron gun and was etched by the ion source during the ion-assisted deposition process. The uniformity of the coating of a 100 GHz DWDM filter is better than ±0.003% over a circular area of 50 mm in diameter when such an etching process is used.

AB - The uniformity of optical narrow-bandpass filters for dense wavelength division multiplexing (DWDM) has been improved by control of the coating parameters of electron guns and the ion source. The optical film was deposited by the electron gun and was etched by the ion source during the ion-assisted deposition process. The uniformity of the coating of a 100 GHz DWDM filter is better than ±0.003% over a circular area of 50 mm in diameter when such an etching process is used.

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DO - 10.1364/AO.44.004402

M3 - 期刊論文

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EP - 4407

JO - Applied Optics

JF - Applied Optics

IS - 20

ER -

Coating uniformity improvement for a dense-wavelength-division-multiplexing filter by use of the etching effect

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