Characterization of silicon oxynitride films deposited by HIPIMS deposition technique

Bo Huei Liao, Chien Nan Hsiao, Ming Hua Shiao, Shih Hao Chan, Sheng Hui Chen, Sheng De Weng

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review


In this research, silicon oxynitride films were prepared by high-power impulse magnetron sputtering. The transmittance of SiON films increased from 13.6% to 88.9% at 215 nm after introducing 2.2 sccm O2 gas. The extinction coefficient was smaller than 1×10-3 from 250nm to 700nm. The average transmittance of the SiON films on the glass in the visible range was 86 % and its hardness was 24 Gpa as introducing 2 sccm O2 gas.

Original languageEnglish
Title of host publicationOptical Interference Coatings, OIC 2019
PublisherOptica Publishing Group (formerly OSA)
ISBN (Print)9781943580583
StatePublished - 2019
EventOptical Interference Coatings, OIC 2019 - Santa Ana Pueblo, United States
Duration: 2 Jun 20197 Jun 2019

Publication series

NameOptics InfoBase Conference Papers
VolumePart F162-OIC 2019
ISSN (Electronic)2162-2701


ConferenceOptical Interference Coatings, OIC 2019
Country/TerritoryUnited States
CitySanta Ana Pueblo


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