Automatic iris mask refinement for high performance iris recognition

Yung Hui Li, Marios Savvides

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

3 Scopus citations

Abstract

How to estimate artifacts on an iris image in polar domain is an important question for any iris recognition system which pursues high recognition rate as its goal. In literature, there are many different existing algorithm that estimate iris occlusion in either Cartesian or polar coordinate. In this paper, our goal is not to propose another new method to compete with existing method. Rather, our goal is to propose a new algorithm which can take any iris mask estimated by existing algorithm, and refine it into a much more accurate mask. In this way, our proposed method could co-work with any other existing algorithm and improve iris recognition performance. Experimental results show our proposed method can improve iris recognition rate by a great lead compared to the performance of the system using the unrefined iris masks.

Original languageEnglish
Title of host publication2009 IEEE Workshop on Computational Intelligence in Biometrics
Subtitle of host publicationTheory, Algorithms, and Applications, CIB 2009 - Proceedings
Pages52-58
Number of pages7
DOIs
StatePublished - 2009
Event2009 IEEE Workshop on Computational Intelligence in Biometrics: Theory, Algorithms, and Applications, CIB 2009 - Nashville, TN, United States
Duration: 30 Mar 20092 Apr 2009

Publication series

Name2009 IEEE Workshop on Computational Intelligence in Biometrics: Theory, Algorithms, and Applications, CIB 2009 - Proceedings

Conference

Conference2009 IEEE Workshop on Computational Intelligence in Biometrics: Theory, Algorithms, and Applications, CIB 2009
Country/TerritoryUnited States
CityNashville, TN
Period30/03/092/04/09

Keywords

  • Biometrics
  • Iris mask estimation
  • Iris recognition
  • Mutual information

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