Autocorrelation function analysis of phase formation in the initial stage of interfacial reactions of multilayered titanium-silicon thin films

T. H. Yang, S. L. Cheng, L. J. Chen

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

Autocorrelation function (ACF) analysis has been applied to the high-resolution transmission electron microscope images of amorphous interlayers formed in the interfacial reactions of ultrahigh vacuum (UHV)-deposited titanium thin films on (001) Si. Ti, Ti5Si3 and Ti 5Si4 were found to form in Ti-rich layers in the as-deposited samples. On the other hand, the nanocrystallites of C49-TiSi 2 and C54-TiSi2 were present in Si-rich layers. The thickness of the amorphous intermining layer increases in multilayered structure with annealing temperature. Phases formed in 573-973 K (300-700°C) annealed samples were also determined.

Original languageEnglish
Pages (from-to)513-517
Number of pages5
JournalThin Solid Films
Volume469-470
Issue numberSPEC. ISS.
DOIs
StatePublished - 22 Dec 2004

Keywords

  • Amorphous
  • Multilayer
  • Nanocrystallite
  • Ti silicides

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