An efficient trapped-charge calculation in amorphous silicon for device simulation

Yao Tsung Tsai, Kuo Don Hong, Yin Lun Yuan

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We present an efficient analytical model for calculating the trapped-charge density as a function of Fermi energy based on two exponential regions for density-of-states distribution in hydrogenated amorphous silicon. in this efficient model, the trappedcharge density is calculated without numerical integration and without curve fitting as a function of Fermi energy. Comparisons between the analytical and the numerical models have been made and excellent agreement has been obtained. Such a model is useful as an aid to study the impact on the performance of amorphous-silicon devices such as thin-film transistors.

Original languageEnglish
Title of host publicationSMS 1993 Technical Digest - 1993 Symposium on Semiconductor Modeling and Simulation
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages75-76
Number of pages2
ISBN (Electronic)0780312252, 9780780312258
DOIs
StatePublished - 1993
Event1993 Symposium on Semiconductor Modeling and Simulation, SMS 1993 - Taipei, Taiwan
Duration: 6 Mar 19937 Mar 1993

Publication series

NameSMS 1993 Technical Digest - 1993 Symposium on Semiconductor Modeling and Simulation

Conference

Conference1993 Symposium on Semiconductor Modeling and Simulation, SMS 1993
Country/TerritoryTaiwan
CityTaipei
Period6/03/937/03/93

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