Abstract
We have designed and fabricated a hollow optical waveguide with omnidirectional reflectors (ODRs) on a0 silicon substrate. The pattern is defined by photolithography on a (100) silicon wafer. The groove is etched by inductive coupled plasma. Plasma-enhanced chemical vapor deposition technology is used to deposit six-pair Si/SiO2 (0.111/0.258 μm) multilayer stacks on the sample. Finally, the top of the sample is covered with an identical ODR. Hence, the light is confined in a hollow waveguide.
Original language | English |
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Article number | 044601 |
Journal | Optical Engineering |
Volume | 45 |
Issue number | 4 |
DOIs | |
State | Published - Apr 2006 |
Keywords
- Hollow waveguide
- Omnidirectional reflector