Abatement of PFCs from semiconductor manufacturing processes by nonthermal plasma technologies: A critical review

Moo Been Chang, Jen Shih Chang

Research output: Contribution to journalReview articlepeer-review

90 Scopus citations

Fingerprint

Dive into the research topics of 'Abatement of PFCs from semiconductor manufacturing processes by nonthermal plasma technologies: A critical review'. Together they form a unique fingerprint.

Chemical Compounds

Engineering & Materials Science