Abatement of perfluorocompounds by tandem packed-bed plasmas for semiconductor manufacturing processes

How Ming Lee, Moo Been Chang, Rung Feng Lu

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

The technological feasibility and chemical kinetics of carbon tetrafluoride (CF4) decomposition with tandem packed-bed plasmas (TPBPs) are investigated in this study. Relevant parameters including types of packing dielectric materials, applied voltage, discharge gap, and Ar additives are extensively investigated. Results demonstrate that the addition of Ar is beneficial to CF4 abatement. Operating at a higher voltage results in higher removal efficiencies. The effect of packing dielectric materials on CF4abatement is in the order of BaTiO3 > Al 2O3> glass pellets, being correlative with their dielectric constants. An overall kinetic model is also developed. Experimental results and kinetic analysis indicate that the CF4 removal efficiency achieved with a TPBP obeys a first-order rate law. The overall removal rate constant (k, s-1) can be expressed in an Arrhenius form, k = 0.1313Ps0.6887, where Ps represents the specific power (W/ cm3). The requirement of 90% reduction of perfluorocompounds for a semiconductor manufacturing process can be accomplished by combining five TPBP reactors in series, being operated at a residence time of 3.2 s and a specific power of 1.2 W/cm3.

Original languageEnglish
Pages (from-to)5526-5534
Number of pages9
JournalIndustrial and Engineering Chemistry Research
Volume44
Issue number15
DOIs
StatePublished - 20 Jul 2005

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