A Pd-PdO Film Potentiometric pH Sensor

Vasilios A. Karagounis, Chung Chiun Liu, Michael R. Neuman, Lubomyr T. Romankiw, P. A. Leary, J. J. Cuomo

Research output: Contribution to journalArticlepeer-review

15 Scopus citations


Palladium-palladium oxide film formed by the RF reactive sputtering technique was used for pH measurement. The potentiometric mode of operation was employed and an Ag/AgCl electrode was used as the reference electrode. The Pd-PdO film was formed on both alumina and polycrystalline silicon, and sputtering conditions to produce Pd-PdO film with good pH response characteristics were empirically defined. The Pd-PdO showed good pH response, ~ 54 mV/[pH] at 25°C over the pH range of 3–9. The temperature dependency and dissolved oxygen effect on the film when used as a pH sensor were investigated and discussed.

Original languageEnglish
Pages (from-to)113-116
Number of pages4
JournalIEEE Transactions on Biomedical Engineering
Issue number2
StatePublished - Feb 1986


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