A new polishing pad of EVA-adhesive-dressed-with-SiC-grits polishing face and its applications in silicon wafer polishing

Sung Lin Tsai, Fuang Yuan Huang, Biing Hwa Yan, Yao Ching Tsai

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

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Engineering & Materials Science