A new observation of strain-induced slow traps in advanced CMOS technology with process-induced strain using random telegraph noise measurement

M. H. Lin, E. R. Hsieh, Steve S. Chung, C. H. Tsai, P. W. Liu, Y. H. Lin, C. T. Tsai, G. H. Ma

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

14 Scopus citations

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Engineering