A multi-step deposited AlN films in a DC pulsed sputtering and film characteristics classification with principal component analysis of OES data

  • Wei Lun Chen
  • , Wei Yu Zhou
  • , Ning Hsiu Yuan
  • , Shang Shian Yang
  • , Peter J. Wang
  • , Hsiao Han Lo
  • , Tomi T. Li
  • , Yiin kuen Fuh

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