A correlation between the kinetics and thermodynamics for the photo-electrochemical etching of N-Si in 2MHF-ethanolic solutions

Wern Dare Jheng, Jing Chie Lin

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In the photo-electrochemical etching of Si/HF system, the kinetics was investigated extensively in the literature. Usually, any problem belonging to science and engineering was solved using both thermodynamic and kinetic aspects. In this work, the kinetic of the system was correlated with the thermodynamics, by introducing the energy bend diagrams, to comprehend the etching trend. The effect of ethanol added into the system was concerned. The results from photo-electrochemical kinetics (i.e., i-v diagram) are in agreement with that expected from thermodynamics via estimation of activation energy estimation from the corresponding energy band diagrams. The SEM morphology reconfirmed the result inferred from both aspects.

Original languageEnglish
Title of host publicationPits and Pores 4
Subtitle of host publicationNew Materials and Applications - In Memory of Ulrich Gosele
PublisherElectrochemical Society Inc.
Pages39-43
Number of pages5
Edition16
ISBN (Electronic)9781566778725
ISBN (Print)9781607682226
DOIs
StatePublished - 2010
EventInternational Symposium on Pits and Pores IV: New Materials and Applications - 218th ECS Meeting - Las Vegas, NV, United States
Duration: 10 Oct 201015 Oct 2010

Publication series

NameECS Transactions
Number16
Volume33
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Conference

ConferenceInternational Symposium on Pits and Pores IV: New Materials and Applications - 218th ECS Meeting
Country/TerritoryUnited States
CityLas Vegas, NV
Period10/10/1015/10/10

Fingerprint

Dive into the research topics of 'A correlation between the kinetics and thermodynamics for the photo-electrochemical etching of N-Si in 2MHF-ethanolic solutions'. Together they form a unique fingerprint.

Cite this