1.3 μm InAs/GaAs quantum dots directly capped with GaAs grown by metal-organic chemical vapor deposition

Kun Fu Huang, Tung Po Hsieh, Nien Tze Yeh, Wen Jeng Ho, Jen Inn Chyi, Meng Chyi Wu

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

In this paper, we investigate the effects of growth temperature and growth rate on the formation of InAs/GaAs quantum dots (QDs) grown by metalorganic chemical vapor deposition. These QDs are formed with large InAs coverage (3.0MLs) and periodic growth interruption via the Stranski-Krastanow epitaxial growth mode. The photoluminescence (PL) spectra at 300K exhibit a red shift in peak wavelength by decreasing the InAs growth temperature from 540°C to 500°C. As the growth rate increases from 0.05 to 0.2ML/s at a growth temperature of 500°C, the PL linewidth decreases and the PL intensity increases. These results are related to the In clusters and uniformity of InAs/GaAs QDs, which are observed by scanning electron microscopy (SEM). Finally, the room-temperature PL spectrum of InAs/GaAs QDs directly capped with GaAs layer shows an emission wavelength at 1.35μm and a narrow linewidth of 30.8meV.

Original languageEnglish
Pages (from-to)128-133
Number of pages6
JournalJournal of Crystal Growth
Volume264
Issue number1-3
DOIs
StatePublished - 15 Mar 2004

Keywords

  • A1. Photoluminescence
  • A3. Metalorganic chemical vapor deposition
  • A3. Quantum dots

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