Research on the Extra-Hard Nitride Thin Film with Sapphire-Level( I )

Project Details


This is a proposal entitled of “Research on the Extra-hard Nitride Thin Film with Sapphire-level” regardingthe development of the extra-hard thin film technique using the high-power impulse magnetron sputteringdeposition technology. The deposition thin-film materials are Al, Si, and Ti based nitride which are includedthe properties of high hardness, good physical / chemical resistance, and easy produce. So the extra-hard thinfilm will be developed based on these techniques for touch panel applications. To reach this purpose thereare four groups from National Central University, Instrument Technology Research Center, and ApogeeOptocom Inc. collaborating to research and develop these key technologies. In this research, the plasmatechnique will be implemented to develop the high-power impulse source to improve the deposition rate,deposition energy and the stability of plasma. Then the system is applied to deposit the transparent hard films.Finally, the multilayer transparent hard films on thin glass for touch screens will be designed andmanufactured.
Effective start/end date1/11/1631/01/18

UN Sustainable Development Goals

In 2015, UN member states agreed to 17 global Sustainable Development Goals (SDGs) to end poverty, protect the planet and ensure prosperity for all. This project contributes towards the following SDG(s):

  • SDG 8 - Decent Work and Economic Growth
  • SDG 17 - Partnerships for the Goals


  • Transparent hard films
  • High-power impulse magnetron sputtering
  • Antireflection theory


Explore the research topics touched on by this project. These labels are generated based on the underlying awards/grants. Together they form a unique fingerprint.