Research on the Extra-Hard Nitride Thin Film with Sapphire-Level( I )

This is a proposal entitled of “Research on the Extra-hard Nitride Thin Film with Sapphire-level” regardingthe development of the extra-hard thin film technique using the high-power impulse magnetron sputteringdeposition technology. The deposition thin-film materials are Al, Si, and Ti based nitride which are includedthe properties of high hardness, good physical / chemical resistance, and easy produce. So the extra-hard thinfilm will be developed based on these techniques for touch panel applications. To reach this purpose thereare four groups from National Central University, Instrument Technology Research Center, and ApogeeOptocom Inc. collaborating to research and develop these key technologies. In this research, the plasmatechnique will be implemented to develop the high-power impulse source to improve the deposition rate,deposition energy and the stability of plasma. Then the system is applied to deposit the transparent hard films.Finally, the multilayer transparent hard films on thin glass for touch screens will be designed andmanufactured.