Research output per year
Research output per year
Project Details
Description
This is a proposal entitled of “CAAC Sputtering Epi Technology for the Application of the Flexible Thin-film Devices” regarding the development of IGZO materials by high power impulse magnetron sputtering developed by the research team.
| Status | Finished |
|---|---|
| Effective start/end date | 1/08/21 → 31/07/22 |
Keywords
- Sputtering Epi Technology
- Flexible Thin-film Device
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Research output
- 1 Article
-
Effect of substrate biasing on the epitaxial growth and structural properties of rf magnetron sputtered germanium buffer layer on silicon
Zeng, G. S., Liu, C. L. & Chen, S. H., Sep 2021, In: Coatings. 11, 9, 1060.Research output: Contribution to journal › Article › peer-review
Open Access2 Scopus citations