極紫外光高反射鏡光學鍍膜技術

Ｗire diameter requirements of semiconductor are getting smaller and smaller,the application of photolithography in the extreme ultraviolet band is becomingmore and more important. It has become a key technology with global strategicvalue, especially the plating and technology mastery of high-reflection mirrors.Most of the research units in aboard are supported by national resources.Although mirror for optical coating applications in the X-ray or EUV has beeninvested by several scholars in Taiwan. However, it has increased with thedifficulty of the process and commercial. Since the beginning of commercialapplication, Taiwan must enter the application of X-ray or EUV for coatingprocess and analysis and measurement as soon as possible. It is hoped thatthrough the investment in the development of extreme ultraviolet light highreflectivemirror optical coating technology in this project. Taiwan will face thefuture and challenges of X-ray and EUV when dealing with the needs, we needtechnical capabilities in this area. After the project is completed, we will cooperatewith manufacturers to develop equipment and manufacturing processes. We canget rid of the current domestic dependence on foreign EUV mirror componentmanufacturers. This project will use Dual Ion Beam Sputtering (DIBS) system, inaddition to ion beam sputtering (IBSD) and adding ion assisted plating (IAD) todeposit periodic Mo/Si films. Coating the barrier layer and capping Layer toimprove the reflectivity, discuss the power, substrate bias, substrate temperature,and working pressure for the Mo/Si film microstructure and interface roughness.The relationship and influence between temperature, interface compositiondistribution, film stress and reflectivity are close to the literature’s 69.5%reflectivity and environmental stability.